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핌스

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PRODUCT

PROMINENT INITIATOR OF MASK SOLUTIONS

Technological Development

S-Mask

  • Apply Slight Etching Technology
  • Shadow Area Dramatic Improvement
  • Process yield improvement
  • Suitalbe for Full screen display

Technology

  • Existing

  • PIMS

F-Mask

  • Consolidate Cover/Support Stick
  • Simplifying the manufacturing process and reducing costs
  • streamline FMM process
  • suitable for manufacturing irregular design of mask

Technology

  • Existing

    Stick (Individual)

  • PIMS

    F-Mask (All-in-one)

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