Technological Development
S-Mask
- Apply Slight Etching Technology
- Shadow Area Dramatic Improvement
- Process yield improvement
- Suitalbe for Full screen display
F-Mask
- Consolidate Cover/Support Stick
- Simplifying the manufacturing process and reducing costs
- streamline FMM process
- suitable for manufacturing irregular design of mask
Technology
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Existing
Stick (Individual)

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PIMS
F-Mask (All-in-one)